I³MS - Nam Seminar
Prof. Dr. Jaewook Nam - Computational Analysis for Thin Film Formation Processes
, Sungkyunkwan University, South Korea
When thin-film manufacturing products such as adhesives, magnetic tapes, battery electrode and optical films are required to be produced at high speed yet maintaining a high degree of uniformity, liquid-phase processing method desirable. The continuous liquid coating process is a method of choice for such purpose, which consisted of numerous unit operations. To maintain a high degree of uniformity, one can exploit surface tension of gas/liquid interfaces, when the coating solution is dilute, which means low viscous liquid. However, an excessive amount of solvent needs to be removed to form a solid film. Therefore, the key steps for the coating process are the application step, where relatively low viscous media to form a liquid layer on a moving substrate, and the drying step, where solidification and microstructure formation occur. Current industrial trends require less solvent or water-based solution (due to environmental regulations) and at the same time requires more functional nano- and micro-particles suspended in the coating liquid (becoming complex fluids). Therefore, understanding underlying physics in forming a thin film and its microstructures for the current coating process become more complex than conventional ones. In this respect, computational analyses play a critical role. In our research group, we focus on computational fluid dynamic analyses of film formation flows or called coating flows and thin-film microstructure evaluations using image analyses. In this seminar, finite element method based analyses on slot coating flow inside and outside coating dies, and the nanowire networks analyses inside the transparent conductive film will be discussed.